Place of Origin: Guangdong, China
Material Introduction:
This product is made from high-purity porous silicon carbide ceramic, designed for stable vacuum adsorption and wafer handling applications. The controlled porous structure helps provide uniform suction, while the SiC material offers good thermal stability, chemical resistance, and long service life in demanding equipment.
Functional Features:
The porous SiC ceramic sucker provides controlled porosity, good air permeability, high temperature resistance, chemical stability, and reliable mechanical strength. It is suitable for precision vacuum holding, wafer transfer, and clean process environments where flatness, adsorption stability, and surface quality are important.
Application Industries:
This component is mainly used in semiconductor ceramic parts, wafer handling systems, vacuum adsorption equipment, LED production, solar cell manufacturing, microelectronics assembly, and other precision ceramic components applications.
Delivery Time:
Typical lead time depends on product size, pore structure, surface finish, tolerance requirements, and order quantity. Custom porous SiC ceramic parts can be evaluated according to drawings, samples, or application requirements before production.
The Precision Porous Silicon Carbide Ceramic Sucker is a custom porous SiC vacuum adsorption component used for wafer handling, vacuum holding, and clean process equipment. Made from porous silicon carbide ceramic, it helps provide stable suction, good flatness, and reliable performance in semiconductor, microelectronics, and precision manufacturing applications.
This product is made from high-purity porous silicon carbide ceramic. Compared with many metal or polymer vacuum parts, porous SiC offers better heat resistance, chemical stability, wear resistance, and dimensional stability in demanding process environments.
The pore structure, outer diameter, thickness, surface finish, flatness, mounting holes, and grooves can be customized according to the drawing and actual equipment requirements. For vacuum adsorption parts, the pore size and surface condition should be matched with suction force, wafer size, and working environment.
In wafer handling and clean manufacturing equipment, ceramic vacuum parts are often used to reduce metal contamination, maintain stable dimensions, and support reliable adsorption during repeated operation. This product is suitable for many semiconductor ceramic parts applications where surface quality and adsorption stability are important.
| Item | Typical Option / Description |
|---|---|
| Product Name | Precision Porous Silicon Carbide Ceramic Sucker |
| Material | High-purity porous silicon carbide ceramic |
| Porosity | Customized according to vacuum adsorption requirements |
| Pore Size | Customized based on suction force, air permeability, and application needs |
| Shape | Round, disc-type, plate-type, or custom shape by drawing |
| Surface Finish | Ground or polished according to working surface requirements |
| Flatness | Controlled according to wafer size and equipment assembly requirements |
| Working Environment | Vacuum adsorption, clean process, thermal process, or corrosive environment |
| Customization | Diameter, thickness, pore structure, mounting holes, grooves, and surface finish |
| Material | Main Strengths | Typical Use |
|---|---|---|
| Porous Silicon Carbide Ceramic | Good thermal stability, chemical resistance, wear resistance, and controlled air permeability | Vacuum suckers, wafer handling, clean process equipment, and high-temperature adsorption parts |
| Porous Alumina Ceramic | Good insulation, stable porous structure, and cost-effective performance | General porous filters, diffusers, vacuum parts, and insulation-related porous components |
| Dense Silicon Carbide Ceramic | Excellent wear resistance, corrosion resistance, and high-temperature performance | Seal rings, liners, pump parts, wear-resistant parts, and high-load structural components |
| Zirconia Ceramic | Higher toughness, smooth surface quality, and good wear resistance | Precision shafts, valve parts, guide parts, and small mechanical components |
It is a ceramic vacuum holding part made with a controlled porous structure. Air can pass through the porous ceramic body, helping the working surface create stable vacuum adsorption.
It is mainly used for wafer handling, vacuum adsorption, cleanroom automation, semiconductor processing, LED manufacturing, solar cell production, and precision positioning equipment.
Silicon carbide ceramic has good heat resistance, chemical stability, hardness, and wear resistance. These properties make it suitable for vacuum, clean, and high-temperature process environments.
Yes. The pore size and porous structure can be customized according to suction force, air permeability, wafer size, and equipment design.
Yes. Flatness can be controlled according to the drawing and application requirements. For wafer handling, surface flatness and uniform adsorption are usually important.
Yes. Porous SiC ceramic suckers are suitable for semiconductor-related vacuum handling and clean process applications where low contamination, stable adsorption, and material durability are required.
Useful information includes 2D or 3D drawings, outer diameter, thickness, pore size, porosity requirement, flatness, surface finish, mounting design, quantity, and working environment.
Yes. Mounting holes, grooves, steps, slots, and other structural features can be customized according to the equipment assembly design.
It depends on the application. Porous SiC is usually more suitable for higher temperature, higher wear, and more demanding chemical environments. Porous alumina can be a practical option for general porous ceramic applications.
Yes. CERAMPRO can support custom evaluation, prototype production, and batch manufacturing according to drawings, samples, or application requirements.
